In the spring of 1994 the Plasma Science Committee and the Committee on Atomic, Molecular, and Optical Sciences of the National Research Council (NRC) established a panel to organize and conduct a workshop on database needs in plasma processing of materials. This activity was motivated by the NRC report Plasma Processing of Materials: Scientific Opportunities and Technological Challenges (National Academy Press, Washington, D.C., 1991), prepared by the Panel on Plasma Processing and Materials under the auspices of the Board on Physics and Astronomy, which pointed out the need for an improved database to enable more quantitative modeling of plasma reactors and processes, especially in the area of integrated circuit manufacturing. The beneficial product of such modeling would be a more competitive and responsive microelectronics industry that serves both defense and civilian markets.

The primary purpose of the workshop, held April 1 and 2, 1995, in Washington, D.C., was to bring together experts with the goal of developing a prioritized list of database and diagnostic needs based on their potential impact on plasma processing technology. This report summarizes the findings of the workshop.

Each of the members of the Panel on Database Needs in Plasma Processing headed an ad hoc group that helped draft a subset of the report, based on input from the workshop participants. The panel thanks the members of these groups for their assistance: P.B. Armentrout, University of Utah; E. Aydil, University of California, Santa Barbara; K.H. Becker, The City College of the City University of New York; R. Buss, Sandia National Laboratories; M.W. Chase, National Institute of Standards and Technology; L.G. Christophorou, Oak Ridge National Laboratory; J.M. Cook, Lain Research Corporation; D. Ernie, University of Minnesota; K.P. Giapis, California Institute of Technology; M.F. Golde, University of Pittsburgh; I.P. Herman, Columbia University; P. Ho, Sandia National Laboratories; R. Johnsen, University of Pittsburgh; Y.-K. Kim, National Institute of Standards and Technology; H. Sawin, Massachusetts Institute of Technology; D.W. Setser, Kansas State University; S. Srivastava, Jet Propulsion Laboratory; W. Tsang, National Institute of Standards and Technology; R.J. Van Brunt, National Institute of Standards and Technology; C. Woods, University of Wisconsin; J. Wormhoudt, Aerodyne Research Inc.; and M. Zachariah, National Institute of Standards and Technology.

In view of the fact that the primary use of data on plasma processing is in technology development in industry, special efforts were made to ensure that there was extensive industrial participation in the workshop, both in breadth and depth. The panel owes a particular debt of gratitude to the following individuals for their active participation in the workshop and for critiquing and improving drafts of the report: Kaihan A. Ashtiani of Materials Research Corporation; Andrew D. Bailey HI of Plasma and Materials Technologies; Joel M. Cook of Lam Research Corporation; Frederick Dill of IBM T.J. Watson Research Center; Vincent Donnelly of Lucent Technologies Bell Laboratories; Erik Egan of Motorola; Sychi Fang of Intel Corporation; David Fraser of Intel Corporation; Abe Ghanbari of Materials Research Corporation; R.A. Gottscho of Lain Research Corporation (formerly of AT&T Bell Laboratories); Michael Hartig of Motorola/Sematech; Les Jerde of Tegal Corporation; Andrew Labun of Digital Equipment Corporation; Michael Mocella of Dupont; Joseph Proud of GTE; Vivek Singh of Intel Corporation; Vikram Singh of Lam Research Corporation; M. Surendra of IBM T.J. Watson Research Center; Alexander Voschenkov of Lain Research Corporation; and Jody Wormhoudt of Aerodyne Research.

The scope of this report is substantial, covering industrial needs for better plasma process engineering, the current state of the art in plasma modeling, and the various supporting databases and diagnostics techniques that underlie and complement modeling and simulation. The report is intended for a variety of audiences: academic and government laboratory researchers, industrial engineers and scientists, and technical program managers at federal agencies. Although it emphasizes industrial and technological applications, the report raises many challenging questions involving fundamental science that underlies the

technological applications, and these challenges should appeal to many in the basic science community as well as to technologists. The fundamental science disciplines to which this report is most relevant include, but are not limited to, plasma science and atomic, molecular, and optical science.

The panel notes that this report has been preceded by several excellent reports that address similar and/or complementary issues from somewhat different perspectives. The Semiconductor Industry Association (SIA), for example, prepares periodic "roadmaps" of industrial needs and potential solutions to guide technology development in critical areas of semiconductor manufacturing. SIA's second such report (The National Technology Roadmap for Semiconductors, SEMATECH, Austin, Tex., 1994) contains numerous insights regarding the role of future plasma processing in semiconductor manufacturing. In 1995 SEMATECH published an important supplement to the SIA roadmap; titled Technology Computer-Aided Design (TCAD) Roadmap: Supplement to the National Technology Roadmap for Semiconductors, it contains a chapter on equipment modeling, including plasma equipment modeling and the database needs for this application. In 1994 SEMATECH published White Paper for a Chemical Kinetics Database to Support Integrated Circuit Manufacture, a report that focuses primarily on modeling and simulation for thermal chemical vapor deposition (CVD) processes and that contains much useful information and valuable insight on the proper approach to developing an equipment modeling database.

As noted above, plasma processing was specifically addressed in the 1991 NRC report Plasma Processing of Materials, which provided the primary motivation for the present activity. In 1995, the NRC published in the Naval Research Laboratory Series a report titled Plasma Processing and Processing Science (National Academy Press, Washington, D.C.). Also published in 1995 was a comprehensive NRC report entitled Plasma Science: From Fundamental Research to Technological Applications (National Academy Press, Washington, D.C.). All of these previously published reports contain useful, often additional, and sometimes conflicting information relevant to the goals of this report. Readers are advised to examine the earlier reports as well, to obtain historical perspective and a broader base of opinion.