Database Needs for Modeling and Simulation of Plasma Processing (1996)

Chapter: Appendix B: Workshop Agenda

Previous Chapter: Appendix A: Acronyms and Abbreviations
Suggested Citation: "Appendix B: Workshop Agenda." National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. doi: 10.17226/5434.

Appendix B:
Workshop Agenda

Saturday, April 1, 1995

0900

Opening Remarks

David B. Graves and Mark J. Kushner, Co-chairs

0910

ARPA Objectives

Bert Hui, Defense Advanced Research Projects Agency

Session I: Industrial Perspectives

A. Equipment Supplier Perspectives

0925

Modeling: A Design Engine For The U.S. Semiconductor Equipment Industry

Alexander M. Voshchenkov, Lain Research Corporation

1005

Challenges in Design and Manufacturing of Semiconductor Process Equipment

Abe Ghanbari, Materials Research Corporation

1045

Break

 

B. Chip Manufacturer Perspectives

1100

Plasma Processes—A Chipmaker's View

Frederick Dill, IBM T.J. Watson Research Center

1140

Digital Semiconductor's Perspective on Plasma Modeling and Database Needs

Andrew Labun, Digital Equipment Corporation

1215

Lunch

 

Session II: Status And Needs Of Modeling And Simulation

A. Tool Scale Simulation

1315

Glow Discharge Plasma Simulation: Current Status, Needs, and Future Outlook

Demetre J. Economou, University of Houston

1345

Development of Design Oriented Simulation Tools for the Microelectronic Industry

Anantha Krishnan, CFD Research Corporation

B. Feature Scale Simulation

1415

Low Pressure Transport and Reaction in Features

Timothy S. Cale, Arizona State University

1445

Feature Scale Simulation and Model Characterization

Vivek Singh, Intel Corporation

1515

Break

 

Session III: Discussion

1530

Breakout Sessions

Industrial Perspectives

Tool Scale

Feature Scale

 

1630

Break

 

1645

Reports on Breakout Sessions

 

1645

Industrial Perspectives

Andrew Labun

Suggested Citation: "Appendix B: Workshop Agenda." National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. doi: 10.17226/5434.

1705

Tool Scale

Demetre Economou

1725

Feature Scale

Vivek Singh

1745

Summary Discussion

David Graves and Mark Kushner

1915

Dinner

 

Sunday, April, 2, 1995

Session IV: Database Needs

0900

Introductory Remarks

David B. Graves and Mark J. Kushner, Co-chairs

0900

Database Needs: Electron Impact Processes

Jean W. Gallagher, National Institute of Standards and Technology

0930

Rate Constants of Heterogeneous Processes in Plasma-Assisted Processing

Gottlieb S. Oehrlein, SUNY Albany

1000

Status of Ion and Neutral Chemistry Databases

Mark J. Kushner, University of Illinois at Urbana-Champaign

1030

Break

 

1045

Thermodynamic and Excited State Data for Plasma Processing

Arthur V. Phelps, JILA

1115

Data Needs for Radiative Processes and Diagnostics

Alan Garscadden, Air Force Wright Laboratory

1145

Critical Evaluation and Dissemination of Plasma Databases

W. Lowell Morgan, Kinema Research and Software

1215

Lunch

 

Session V: Discussion

1315

Breakout Sessions

Electron Impact Processes

Heterogeneous Processes

Ion Impact Processes and Neutral Chemistry

Thermochemistry of Reactive Species

Radiative Processes and Diagnostics

 

1445

Break

 

1500

Reports on Breakout Sessions

 

1500

Electron Impact Processes

Jean Gallagher

1520

Heterogeneous Processes

Gottlieb Oehrlein

1540

Ion Impact Processes and Neutral Chemistry

Mark Kushner

1600

Thermochemistry of Reactive Species

Arthur Phelps

1620

Radiative Processes and Diagnostics

Alan Garscadden

1640

Summary Discussion

David Graves and Mark Kushner

1800

Adjourn

 

Suggested Citation: "Appendix B: Workshop Agenda." National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. doi: 10.17226/5434.
Page 61
Suggested Citation: "Appendix B: Workshop Agenda." National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. doi: 10.17226/5434.
Page 62
Next Chapter: Appendix C: Workshop Participants
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